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By leveraging compact and neural network models, we predict capacitance performance with unprecedented accuracy.

This study demonstrates how deposition-etch cycling can reduce LER and improve device performance.

Virtual fabrication is a powerful tool to perform sensitivity analysis and provide guidance for inline process spec control

With continuous device scaling, process windows have become narrower and narrower due to smaller feature sizes and greater process step variability [1]. A key task during the R&D stage of...

Design of Experiments (DOE) is a powerful concept in semiconductor engineering research and development. DOEs are sets of experiments used to explore the sensitivity of experimental variables and...