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Lam Semiverse® Solutions engineers used SEMulator3D® stress modeling to show how channel thickness, fin width, and lateral etch can be optimized to reduce stress non-uniformity and improve gate-all-around nanosheet transistor performance.

Learn how feedforward control helps semiconductor manufacturers reduce wafer scrap and improve yield. Semiverse Solutions simulation demonstrated a pass-rate increase from 60.82% to 96.77% through intelligent process correction.