Blog

Women in Leadership at Lam has over 200 members Lam India has increased its diversity hiring percentages In recognition of International Women’s Day, Tina Correia, chief accounting officer, head...

Gosia’s redirection in her studies resulted in a 20+ year long career in semiconductors A little bit of luck and a whole lot of talent got her to where she is today I sat down with Gosia...

Soumya has automated Lam’s product software testing and processes for 19 years. The software she works on allows us to validate the behavior of our tool's software at any fab remotely. Soumya...

With decreasing dynamic random-access memory (DRAM) cell sizes, DRAM process development has become increasingly difficult. Bit-line (BL) sensing margins and refresh times have become problematic...

SEMICON Korea 2023 kicked off with a keynote speech, “Accelerating Innovation – From Lab to Fab,” delivered by Pat Lord, EVP of the Customer Support Business Group and Global Operations. Pat...

Lam’s BEN ERG has grown by four times over a two-year period Our I&D actions and behaviors impact the communities where we live and work In recognition of Black History Month, Sherry Buie,...

Metryx marked 200th tool shipment by donating science equipment to a local high school

Nearly 2,000 employees participated in Deliver Joy programs, supporting 1,300 organizations More 10,640 volunteer hours were logged by our employees Deliver Joy in November and December is a...

Sunday, January 22, marks the start of Lunar New Year. Across the world, including much of East Asia, nearly 1.5 billion people will ring in the Year of the Rabbit. According to the Chinese...

Line edge roughness (LER) can occur during the exposure step in lithography [1-2]. Similarly, etch and deposition process steps can leave a roughness on semiconductor surfaces. LER is a stochastic...