| Su | Mo | Tu | We | Th | Fr | Sa |
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| Su | Mo | Tu | We | Th | Fr | Sa |
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|Sep 29, 2026|Lam’s Semiverse Solutions team used digital twin modeling to explore a self-aligned CFET architecture that could help extend CMOS scaling beyond 10 Å.
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|Sep 29, 2026|Lam Research’s new Silicon Valley warehouse speeds semiconductor parts retrieval and strengthens U.S. supply chain resilience.
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|Sep 8, 2026|AI is increasing demand for larger and more complex chip packages. Traditional wafer-based packaging faces scaling challenges for large-format designs. Panel-level processing may improve...
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|Aug 31, 2026|Lam Research broke ground on a new advanced R&D lab in Tualatin, Oregon, expanding cleanroom capacity and strengthening its global lab network.
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|Aug 25, 2026|Lam Semiverse® Solutions engineers used SEMulator3D® stress modeling to show how channel thickness, fin width, and lateral etch can be optimized to reduce stress non-uniformity and improve gate-all-around nanosheet transistor performance.
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|Aug 13, 2026|Lam's labs are part of a purpose-built, globally integrated R&D infrastructure designed to accelerate innovation across technology inflections.
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|Jul 30, 2026|Learn how feedforward control helps semiconductor manufacturers reduce wafer scrap and improve yield. Semiverse Solutions simulation demonstrated a pass-rate increase from 60.82% to 96.77% through intelligent process correction.
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|Jul 21, 2026|SABRE 3D is an electrochemical deposition solution engineered for precision copper plating (the critical wiring of modern semiconductor devices).
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|Jul 14, 2026|A joint paper from Lam Research, ASML, and imec puts 20 nm metal pitch in focus
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|Jul 9, 2026|AI is redefining semiconductor scaling Audrey Charles discusses the technologies, partnerships, and innovations that will define the future of semiconductor scaling AI is driving unprecedented...
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|Jul 2, 2026|A Lam scanning electron microscope technician shares how he started a career at Lam Research and continues his journey today as a lab supervisor.
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|Jun 29, 2026|SEMulator3D virtual fabrication optimizes backside power networks by modeling nTSV-to-BPR connectivity.
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|Jun 25, 2026|Panel-level packaging enables higher area efficiency and scalability for large-format advanced packages
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|Jun 18, 2026|See how Lam’s dry resist technology helps enable the precision, flexibility, and efficiency needed for next-generation EUV chipmaking.
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|Jun 16, 2026|As AI accelerates demand for advanced chips, sustainability is becoming essential for long-term growth
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|Jun 8, 2026|Driving the news: Lam Research moved up the Fortune 500, reflecting strong revenue in Lam’s most recent fiscal year as demand for advanced semiconductor accelerates in the AI era. Lam ranked 238...
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|May 28, 2026|Digital twin technology combined with machine learning enables a dramatic yield improvement from 1.6% to 87.2% in GAA logic manufacturing by simulating and optimizing the entire fabrication process.
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|May 27, 2026|The 2026 Lam Capital Venture Competition highlighted breakthrough semiconductor innovations with Lightfinder winning for its chip-scale optical sensing technology designed to enable real-time, in-tool metrology. This event showcased Lam Research's leadership in supporting startups that build the AI backbone for semiconductor manufacturing.
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|May 19, 2026|Equipment Intelligence® encompasses Lam’s technology portfolio both on and off tool to leverage sensors, data, algorithms, artificial intelligence, and robotics automation to make tools more autonomous and productive.
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|May 7, 2026|As semiconductor manufacturing grows more complex, sensor‑driven intelligence is emerging as a critical enabler of autonomous, data‑driven fabs.
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|Apr 27, 2026|Lam Research won two prestigious 2026 Edison Awards, for ALTUS® Halo and Akara®
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|Apr 27, 2026|Pattern-dependent etch can lead to variations across the same chip. Dummy fill and SEMulator3D® help reduce shallow trench isolation and recess nonuniformity.
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|Apr 16, 2026|In semiconductor manufacturing, precision is everything. As chips become more advanced and fabs operate under unprecedented pressure to meet AI-driven demand, even the smallest maintenance error...
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|Apr 14, 2026|Everything—NAND, Logic, DRAM, and packaging—is going 3D. The 3D era demands deeper etch and precise deposition to build taller, tighter devices.
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|Apr 8, 2026|In this edition of Semi 101, we explore the evolution of transistor architectures that have enabled logic scaling.
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|Apr 2, 2026|Lam’s leadership in 3D NAND built the playbook for memory’s complex architectural transition. Companies that learn from and apply their experience will lead the way to 3D DRAM.
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|Mar 31, 2026|In DRAM SAQP, small process variations can compound into pitch walk and, with LER, create line-bridge defects. Monte Carlo virtual fabrication reveals these interactions to tighten process windows and reduce wafer experimentation.
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|Mar 26, 2026|Lam solutions for large 300-mm wafers aid in MEMS evolution. MEMS sensors are crucial in AI-powered devices and IoT. applications.
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|Mar 24, 2026|AI is compressing chip development timelines and raising the stakes for equipment suppliers Here is how Lam is responding Speed has always mattered in the semiconductor industry. What is different...
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|Mar 19, 2026|Integrity isn’t optional at Lam, and this latest recognition underscores that commitment.
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|Mar 17, 2026|IBM and Lam Research have partnered in a five-year collaboration to develop processes that enable logic chip scaling beyond the 1nm node using high-NA EUV lithography.
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|Mar 10, 2026|The 2026 Lam Capital Venture Competition is a unique event that connects semiconductor startups with industry leaders, investors, and technical experts to advance AI-enabled semiconductor technologies.
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|Mar 2, 2026|Light-based interconnects dramatically improve AI computing speed, energy efficiency. Lam’s precision etch and dep tech make photonics manufacturable at scale.
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|Feb 26, 2026|SEMulator3D® Analytics is useful in calibrating FinFET device profiles, helping engineers achieve high precision in modeling fin etch depth and critical dimensions.
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|Feb 24, 2026|With AI's overwhelming demand for DRAM, Lam is accelerating its response with streamlined workflows and specialized tools help speed efficiency, yield, and cost savings.
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|Feb 19, 2026|As a viable alternative to silicon, gallium nitride (GaN) can help data centers meet the growing demands of AI by enabling more efficient power delivery and reducing energy consumption.
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|Feb 17, 2026|Boise investment keeps Lam’s capabilities tightly coupled to customer roadmaps
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|Feb 13, 2026|DRAM scaling has reached the angstrom level—and the advanced architectures and processes that make higher performance and lower cost per bit possible. Watch now to see how memory keeps getting smaller.
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|Feb 12, 2026|Lam Research and CEA-Leti have formed a multi-year partnership to accelerate the development of specialty technology devices critical for AI hardware. This collaboration focuses on advancing materials, processes, and manufacturable solutions to improve energy efficiency and performance in AI data centers.
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|Feb 11, 2026|Lam Research’s Aether dry resist technology eliminates pattern collapse and reduces defects, enabling precise, high‑aspect‑ratio features for next‑generation 3D DRAM and HBM.
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|Feb 5, 2026|With over 40 years in making semiconductor equipment, Lam Research has demonstrated leadership in etch and deposition that meet the precision and yield demands of advanced packaging, helping customers ramp new technologies with confidence.
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|Jan 29, 2026|Not every chip on a wafer behaves the same; even small variations can impact yield. The Lam Semiverse Solutions team explains how engineers use virtual fabrication to understand why these differences happen and how to fix them.
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|Jan 23, 2026|Lam’s Aether® dry‑resist technology plays a key role in enabling next-gen logic chips, including the latest 2 nm node
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|Jan 23, 2026|Fortune has named Lam to its World’s Most Admired Companies list for 2026.
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|Jan 15, 2026|Lam Research is setting the agenda for the wafer fabrication equipment industry's approach to a silicon photonics revolution
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|Jan 12, 2026|DRAM is volatile memory that has the advantages of simplicity and high density. Lam is continuously innovating for each DRAM inflection as data-intensive AI requires more and more data at higher speeds.
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|Jan 8, 2026|Lam Research improved its CDP Climate Change score from B to A-, reflecting progress toward our net zero goal and commitment to transparency.
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|Jan 7, 2026|Lam’s newest innovation, the VECTOR® TEOS 3D tool, is crafted at its Tualatin, Oregon facility by a talented local workforce known for its multidisciplinary expertise. The company’s strong commitment to employee safety, career satisfaction, and professional growth has resulted in an outstanding retention rate, making Tualatin a standout example of manufacturing excellence.
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|Dec 18, 2025|Manufacturing breakthroughs in advanced chip packaging—especially heterogeneous integration and 3D stacking—are critical to powering the future of AI.
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|Dec 9, 2025|Watch the video on the next wave of semiconductor innovation with advanced packaging solutions from Lam Research.
